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together with the referenced standards
and message services that enable the host computer to obtain the equipment data required for equipment performance tracking in an automated and consistent manner
SEMI M68 — Test Method for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric
This Test Method clarifies the differences when evaluating films and other components and its materials
& Safety Committeeで技術的に承認されている。現版は2010年12月21日，global Audits and Reviews Subcommitteeにて発行が承認された。2011年2月にwww
P04400 - SEMI P44 - マスク装置向けオープン・アートワーク・システム・インターチェンジ・スタンダード（OASIS®）の仕様 StdTpc-Documentation/Training together with the referenced standardsglobal Micropatterning Committee2009513global Audits and Reviews Subcommittee20096www. semi. org20097CD ROM200511200811 OASISOASIS. MASK Referenced SEMI Standards SEMI P39 OASIS Open Artwork System InterchangeStandard