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SEMI G21-84 (first published)
This guideline may be improved to be a specification after this effort
illustrate
本安全基準之目的係在設定半導體、FPD、PV製造及其他使用易燃性矽化合物製程設備之最低安全與衛生設計標準。
想定読者
P02100 - SEMI P21 - マスク描画装置の精度表示のガイドライン StdPbc-0221 SEMI G21-84 (first published)NOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeJapanese Micropatterning Committee2003428Japanese Regional Standards Committee20036www. semi. org200371992 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to