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SEMI C23-0714 (Reapproved 0620)
This Document covers requirements for sulfur hexafluoride used in the semiconductor industry
SEMI D3 — Quality Area of FPD Substrates
It is the intent of this Document to provide general guidelines for preparation of calibration gas mixtures in compliance with ISO 6142
of the diborane (see Appendix 1)
C08000 - SEMI C80 - Guide for Tetrakis(Dimethylamino) Silane (TDMAS) StdDcs-Withdrawn SEMI C23-0714 (Reapproved 0620)The purpose of this Document is to provide a guide for tetrakis(dimethylamino) silane (TDMAS) for which a need has been identified. The scope of this Document covers high purity TDMAS which is used in the semiconductor industry for the deposition of silicon oxide and silicon nitride based layers by atomic layer deposition. Referenced SEMI Standards SEMI C1 Guide for the Analysis of Liquid Chemical
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